Intel’s 22nm node will use bulk silicon, with a fully depleted tri-gate transistor structure. Instead of having the channel sandwiched between the. Separately, it announced a 22nm low-power FinFET node to compete for foundry business with fully depleted silicon-on-insulator (FD-SOI) from Confirms Move to Intel’s 22nm Process Featuring 3-D Tri-Gate Transistors. Contact: email @ Abstract. A 22nm generation logic technology is described incorporating fully-depleted tri-gate transistors for the first time.
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